PHOTORESIST POLYMERS

QCM-D TO STUDY DISSOLUTION MECHANISMS IN PHOTORESIST POLYMERS

INTRODUCTION
Many newly developed photoresist
polymers swell when exposed to the
developing solution, which is used
when creating a microlithographic
structure with photoresist polymers.
For these polymers, the effects on the
rate of dissolution due to the swelling
process are poorly understood.
The study reported in this application
note explores the response of a thin
film to an aqueous alkaline solution
as a function of the composition of the
polymer as it changes. The study was
conducted in real time using Quartz
Crystal Microbalance with Dissipation
monitoring (QCM-D). The reported
data challenges the current models
of photoresist polymer film dissolution
mechanisms that do not take into
account the swelling properties of the
film.